Nuevo Equipos De Deposición (Cvd, Pvd) en Guangdong, China

AIRPORT

PVD Physical vapor deposition

There are three types of equipment: 500, 700 and 900.The system is mainly composed of evaporation chamber, rotating substrate frame, light heating system, electron gun and electron gun power supply, quartz crysta...

CVD equipment for graphene and carbon nanotube materials

PECVD process of cold infrared chip

Inductive coupling plasma etching (icp) system

PECVD Plasma enhanced chemical vapor deposition equipment

◆ loading quantity: 384 pieces/boat (125 * 125); 336 pieces/boat (156 * 156) | ◆ cleanliness of purification table: Grade 100 (Grade 10000 plant) | ◆ automation degree: automatic control of temperature and proces...

MDPS-560 Pyriform Double Chamber Sputtering System

MDICP-5000F Fully automatic ICP etching machine

▲alarm system: Safety requirements for equipment. | 1. limit vacuum: Etching chamber 9.0×10-5Pa (Indoor humidity≤55%) | 2. etching material: Ⅲ、ⅤMaterial、Si 、SiO2,etc | 3. etching rate: ~ 1μ/min | 4. etching unifo...

Reactive ion etching system

Heterojunction plate type PECVD

High temperature PECVD process