MDXN-25D Mask aligner en Cantón, Guangdong, China
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Especificaciones
- Condición
- nuevo
- 1.exposure type
- lado único.
- 2.exposure area
- 110×110 mm.
- 3.uneven exposure illumination
- ≤±3%.
- 4.exposure intensity
- 0-30 mW/cm2 ajustable.
- 5.uv beam angle
- ≤3°.
- 6.central wavelength of ultraviolet light
- 365 nm.
- 7.uv light source lifespan
- ≥500 horas.
- 9.exposure resolution
- 1 μm;
- 11.alignment range
- Ajuste de X,Y ±4 mm; Ajuste de dirección Q ±3°;
- 12.engraving accuracy
- 1 μ El usuario debe cumplir la exactitud de la“versión”y de la“pieza”con las regulaciones nacionales,
- Categoría
- Mask Aligners en China
- ID de Anuncio
- 91750800
Descripción
MDXN-25D Mask aligner
Purpose
and characteristics
This equipment is a
precision lithography machine developed by our company specifically for the use
characteristics of lithography machines in various colleges and research
is mainly used for the development and production of small and
medium-sized integrated
circuits,semiconductor components,optoelectronic devices,and surface
acoustic wave devices.
On the premise of
maintaining the original main technical indicators of the equipment, we have
optimized some structures and components of the equipment, reduced some
unnecessary mechanical actions, and ensured that the failure points of the
equipment are minimized as much as possible, and the operation of the equipment
is also very stable and reliable.
Main technical parameters
8.Adopting
electronic shutter.
10.Microscopic
scanning range:X:±15mm Y:±15mm;
and
the environment,temperature,humidity,and dust can be strictly
controlled.