Usado spectroscopy en environmental-solution

NT240 series

• Fabricante: Ekspla

Signal: horizontal | Idler: vertical | Sh and sf: ��� | Opo: 450 ��J | Pulse repetition rate: 1000Hz | Pulse duration��3): 4���������6 ns at 1064��nm | Linewidth��4): <��5��cm���1 | Typical beam diameter��6): 3 �...

NT250 series

• Fabricante: Ekspla

Signal: horizontal | Idler: vertical | Sh: horizontal | Opo��2): 1100 ��J | Sh��3): 200 ��J | Pulse repetition rate: 1000Hz | Pulse duration��4): 1���������4 ns | Linewidth��5): <10cm1 | Typical beam diameter��7)...

NL230

At 1064 nm: <��1.0 % | At 532 nm: <��2.5 % | At 355 nm: <��3.5 % | At 266 nm: <��5 % | Pulse repetition rate: 50Hz | Power drift��4): < ��3 % | Pulse duration��5): 3����� 6 ns | Linewidth: <���1��cm���1 at 1064��...

NanoFlux SLM series

At 1064 nm: �����0.8 % | At 532 nm 2) 3): 1000 mJ | At 355 nm (2): 450 mJ | At 266 nm (2): 140 mJ | Pulse repetition rate: 10Hz | Pulse duration��4): 2 ����0.5 ns | At 532 nm: �����1.5 % | At 355 nm: �����3 % | A...

NL300 series

Pulse repetition rate: 10Hz | At 1064 nm: 1.0 % | At 532 nm (2): 400 mJ | At 355 nm (3): 250 mJ | At 266 nm (4): 80 mJ | At 213 nm (5): 13 mJ | At 532 nm: 1.5 % | At 355 nm: 3.0 % | At 266 nm: 3.5 % | At 213 nm: ...

NT340 series

• Fabricante: Ekspla

Signal: horizontal | Idler: vertical | Sh generator (optional): 210 410 nm | Sh/sf generator (optional): 210 410 nm | Duv generator (optional): 192 210 nm | Mir generator (optional): n / a | Opo��4): 30 mJ | Sh g...

NL200

At 1064 nm: <��0.5 % | At 532 nm: <��2.5 % | At 355 nm: <��3.5 % | At 266 nm: <��4 % | At 213 nm: <��5 % | Typical pulse duration��6): 7����� 10 ns | Power drift��7): ����2 % | Pulse repetition rate: 0���������25...

Nanoscale Imaging & Spectroscopy

Perkin Elmer Optima 8000 ICP-OES ICP-Optical Emission Spectroscopy

• Fabricante: Perkin Elmer
• Modelo: Optima

Uso previsto/disciplina: INDUSTRIA

PI-MAX 4

Pi-max 4 1024 emb pm4-1024-emb: 1024 x 1024 13 µm | Pi-max 4 1024i pm4-1024i: 13.1 x 13.1 mm 12.8 µm | Pi-max 4 1024f pm4-1024f: 13.3 x 13.3 mm 13 µm | Pi-max 4 256f pm4-256f: 25 x 6.6 mm 26 µm | Pi-max 4 2048f p...

SIEMENS Verio 3T

• Fabricante: Siemens

McPHERSON Model 209

• Fabricante: McPherson

XEI Scientific Evactron E50 E-TC De-Contaminator Remote Plasma Source Commonly Used For SEM, TEM, ALD, & PVD Sample and Substrate Preparation

iDus 401 CCD